Company Filing History:
1 out of 256 
1 out of 832,912 Years Active: 2013
Title: Innovations in Photosensitivity: The Contributions of Fuwei Wu
Introduction: Fuwei Wu, an inventor based in Jiangsu, China, has made significant contributions to the field of photosensitivity through his patented invention. With a concentrated focus on semiconductor technology, Wu has demonstrated the ability to innovate within complex frameworks by developing novel devices that enhance performance and efficiency.
Latest Patents: Wu's notable patent, titled "Photosensitive detector with composite dielectric gate MOSFET structure and its signal readout method," presents an advanced solution for detecting light with high precision. This invention features a composite dielectric gate MOSFET structure formed on a p-type semiconductor substrate, where n-type semiconductor regions are strategically placed to establish a source and a drain. The inventive design includes multiple dielectric layers that effectively store photoelectrons while minimizing leakage currents, enhancing both imaging speed and dynamic range compared to conventional CCDs. This patent reflects a remarkable leap in technology, merging compatibility with flash memory fabrication and improving accuracy in signal readout.
Career Highlights: Throughout his career, Fuwei Wu has collaborated with leading institutions, including Nanjing University. His work in this esteemed institution underscores his commitment to advancing semiconductor technology and promoting innovative solutions within the industry. Wu's inventiveness is evident not only in his patents but also in his contributions to research and technology advancement.
Collaborations: Fuwei Wu has worked alongside talented colleagues like Feng Yan and Rong Zhang, fostering an environment of innovation and collaborative effort that has propelled their projects forward. These relationships have further enriched Wu's work, creating synergies that enhance research outcomes and paving the way for future advancements in the field.
Conclusion: Fuwei Wu's inventive spirit and contributions to the field of photosensitivity exemplify the impact of dedicated research and innovation. His patented technology represents a significant stride in enhancing imaging speed and signal accuracy, while also showcasing the potential for scalability and compatibility within existing technologies. As he continues to push the boundaries of what's possible in semiconductor research, Wu stands as a prominent figure in the advancement of modern engineering.