Hino, Japan

Futoshi Wada

This inventor holds 1 USPTO granted patent. Top assignee: Konica Corporation. Active years: 1996.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Futoshi Wada. Retrieved from https://idiyas.com/inventor/futoshi-wada-4w45mxf1

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 1996

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1 patent (USPTO):Explore Patents

Title: Futoshi Wada: Innovator in Photosensitive Material Processing

Introduction

Futoshi Wada is a notable inventor based in Hino, Japan. He has made significant contributions to the field of material processing, particularly in the development of technologies related to photosensitive materials. His innovative work has led to the filing of a patent that showcases his expertise and creativity.

Latest Patents

Wada holds a patent for a "Sheet-like material processing apparatus and photosensitive material." This invention involves an apparatus designed for processing photosensitive materials, where a flow of the processing solution is created on the surface of the material. The apparatus ensures that the synthetic flow speed on the surface of the photosensitive material is not less than 80 mm/sec. This synthetic flow speed is a combination of the flow speed component of the processing solution and the conveyance speed component provided by a conveyance device. This innovation enhances the efficiency and effectiveness of processing photosensitive materials.

Career Highlights

Futoshi Wada is associated with Konica Corporation, a leading company in imaging and printing technologies. His role at Konica has allowed him to work on cutting-edge projects that push the boundaries of material processing. His dedication to innovation is evident in his patent and the impact it has on the industry.

Collaborations

Wada has collaborated with notable colleagues, including Teruo Kashino and Shinichi Otani. These partnerships have fostered a creative environment that encourages the exchange of ideas and advancements in technology.

Conclusion

Futoshi Wada's contributions to the field of photosensitive material processing exemplify the spirit of innovation. His patent and work at Konica Corporation highlight his commitment to advancing technology in this area. His collaborations further enhance the potential for future breakthroughs in material processing.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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