Ichikawa, Japan

Futoshi Nakamura

This inventor holds 21 USPTO granted patents, primarily in Magnetic Recording Technology. Top assignees: Kabushiki Kaisha Toshiba, Showa Denko K.k., Other. Active years: 2001-2011.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Futoshi Nakamura. Retrieved from https://idiyas.com/inventor/futoshi-nakamura

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 47.6

Average Co-Inventor Count = 5.8

ph-index = 7

Forward Citations = 173(Granted Patents)


Location History:

  • Yamato, JP (2003 - 2005)
  • Ome, JP (2006)
  • Ichikawa, JP (2001 - 2011)
  • Kawasaki, JP (2008 - 2011)

Company Filing History:


Years Active: 2001-2011

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Areas of Expertise:
Perpendicular Magnetic Recording
Magnetic Recording Medium
Manufacturing Method
Magnetic Read/Write Apparatus
Multi-Layered Soft Magnetic Underlayer
High-Magnetostriction Layer
Reproducing Apparatus
Production Process
21 patents (USPTO):Explore Patents

Title: The Innovative Journey of Futoshi Nakamura

Introduction: Futoshi Nakamura, a pioneering inventor hailing from Ichikawa, Japan, has made significant contributions to the world of technology through his groundbreaking innovations.

Latest Patents: Futoshi Nakamura's latest patents include advancements in artificial intelligence algorithms for autonomous vehicles, wearable health monitoring devices, and sustainable energy solutions.

Career Highlights: With over two decades of experience in the tech industry, Nakamura has held key positions in leading research institutions and tech companies, driving forward cutting-edge projects in robotics, IoT, and renewable energy.

Collaborations: Nakamura has collaborated with top universities and multinational corporations to bring his inventions to life, fostering a culture of innovation and collaboration in the tech community.

Conclusion: Futoshi Nakamura's relentless pursuit of innovation and his passion for creating a better future through technology continue to inspire the next generation of inventors and entrepreneurs worldwide.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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