Hitachi, Japan

Futami Kaneko


Average Co-Inventor Count = 3.0

ph-index = 2

Forward Citations = 13(Granted Patents)


Company Filing History:


Years Active: 1991-1992

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2 patents (USPTO):Explore Patents

Title: The Innovations of Futami Kaneko

Introduction

Futami Kaneko is a notable inventor based in Hitachi, Japan. He has made significant contributions to the field of photopolymerizable compositions, holding two patents that showcase his innovative spirit and technical expertise.

Latest Patents

Kaneko's latest patents include a photopolymerizable composition that comprises an addition polymerizable compound, an N-aryl-α-amino acid, and a photosensitizer capable of absorbing light with a wavelength of 300 nm or more. This composition is recognized for its excellent sensitivity to irradiated light, making it suitable for preparing relief images and photoresists. Another patent features a photopolymerizable composition that includes an addition polymerizable compound with a boiling point of 100°C or higher under atmospheric pressure, a photoinitiator, and a benzene derivative. This formulation provides a cured film with high strength, ideal for producing printed circuit boards.

Career Highlights

Futami Kaneko is associated with Hitachi Chemical Company, Ltd., where he has been able to apply his innovative ideas in a practical setting. His work has contributed to advancements in materials science, particularly in the development of photopolymerizable materials.

Collaborations

Kaneko has collaborated with notable coworkers such as Makoto Kaji and Nobuyuki Hayashi, further enhancing the innovative environment at Hitachi Chemical Company.

Conclusion

Futami Kaneko's contributions to the field of photopolymerizable compositions highlight his role as a significant inventor in Japan. His patents reflect a commitment to innovation and the advancement of technology in materials science.

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