Ibaraki, Japan

Fumiya Nemoto

This inventor holds 1 USPTO granted patent. Top assignee: Jx Nippon Mining Metals Corporation. Active years: 2011.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Fumiya Nemoto. Retrieved from https://idiyas.com/inventor/fumiya-nemoto

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2011

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1 patent (USPTO):Explore Patents

Title: Fumiya Nemoto: Innovator in Sputtering Technology

Introduction

Fumiya Nemoto is a notable inventor based in Ibaraki, Japan. He has made significant contributions to the field of sputtering technology, particularly with his innovative designs that enhance the efficiency and safety of transporting sputtering targets.

Latest Patents

Fumiya Nemoto holds a patent for a "Sputtering target transport box." This invention pertains to a transport box designed specifically for sputtering targets. The box features a void the size of a sputtering target, with supports for mechanical transport integrated into the bottom plate. Additionally, a wheel for man-powered transport is provided at the edge of the bottom plate. This design allows for easy removal and transport of sputtering targets, ensuring that they can be moved without sustaining any damage. He has 1 patent to his name.

Career Highlights

Fumiya Nemoto is currently employed at JX Nippon Mining & Metals Corporation, where he continues to work on advancements in sputtering technology. His role at the company allows him to apply his innovative ideas in a practical setting, contributing to the development of new materials and processes.

Collaborations

Fumiya collaborates with his coworker, Atsushi Inoue, to further enhance their research and development efforts in the field of sputtering technology.

Conclusion

Fumiya Nemoto's contributions to sputtering technology through his innovative patent demonstrate his commitment to improving the efficiency and safety of material transport. His work at JX Nippon Mining & Metals Corporation continues to influence advancements in this critical area of technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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