Kitakyushu, Japan

Fumiya Ishikawa

This inventor holds 2 USPTO granted patents. Top assignees: Mitsubishi Chemical Industries Limited, Mitsubishi Kasei Corporation. Active years: 1989-1990.


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 13(Granted Patents)


Company Filing History:


Years Active: 1989-1990

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2 patents (USPTO):Explore Patents

Title: Fumiya Ishikawa: Innovator in Metal Ion Extraction

Introduction

Fumiya Ishikawa is a notable inventor based in Kitakyushu, Japan. He has made significant contributions to the field of metal ion extraction, holding a total of 2 patents. His innovative methods have the potential to impact various industries that rely on metal ion processing.

Latest Patents

Ishikawa's latest patents focus on a method for extracting metal ions. This method involves contacting an aqueous solution containing the metal ions with an acidic phosphoric acid ester. The specific acidic phosphoric acid ester used is characterized by the formula: ##STR1##, where R.sup.1 is an alkylphenyl group with 7 to 18 carbon atoms, and R.sup.2 is an alkyl group with 1 to 18 carbon atoms. This innovative approach enhances the efficiency of metal ion extraction processes.

Career Highlights

Throughout his career, Fumiya Ishikawa has worked with prominent companies such as Mitsubishi Kasei Corporation and Mitsubishi Chemical Industries Limited. His experience in these organizations has contributed to his expertise in the field of chemical engineering and metal ion extraction.

Collaborations

Ishikawa has collaborated with notable colleagues, including Tsugio Kaneko and Yoshinobu Nishiyama. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Fumiya Ishikawa's contributions to the field of metal ion extraction through his patents and collaborations highlight his role as an influential inventor. His work continues to pave the way for advancements in chemical processing technologies.

Profile summary based on public USPTO records.
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