Aichi, Japan

Fumitoshi Sugiura

This inventor holds 1 USPTO granted patent. Top assignee: Other. Active years: 1991.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Fumitoshi Sugiura. Retrieved from https://idiyas.com/inventor/fumitoshi-sugiura-mx82j2ee

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:

goldMedal1 out of 834,570 
Other
 patents

Years Active: 1991

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1 patent (USPTO):Explore Patents

Title: Fumitoshi Sugiura: Innovator in Graft Copolymers

Introduction

Fumitoshi Sugiura is a notable inventor based in Aichi, Japan. He has made significant contributions to the field of materials science, particularly in the development of graft copolymers. His innovative work has led to advancements in the use of additives for unsaturated polyester resins.

Latest Patents

Sugiura holds 1 patent for his invention titled "Graft copolymers effective as additives to unsaturated polyester resins." This patent describes a graft copolymer that contains 10-80 weight % of a specified macromonomer, 20-89.9 weight % of a different vinyl monomer, and 0.1-5 weight % of additional vinyl monomers. The invention may also include up to 40 weight % of another specified constituent.

Career Highlights

Throughout his career, Sugiura has focused on enhancing the properties of materials used in various applications. His research has contributed to the development of more effective additives that improve the performance of unsaturated polyester resins.

Collaborations

Sugiura has worked alongside talented colleagues, including Tatsuhiko Ozaki and Hirotaka Wada. Their collaborative efforts have furthered research and innovation in the field of graft copolymers.

Conclusion

Fumitoshi Sugiura's work in the development of graft copolymers showcases his dedication to innovation in materials science. His contributions continue to influence the industry and pave the way for future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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