Yokohama, Japan

Fumiko Nonaka

This inventor holds 1 USPTO granted patent. Top assignee: Asahi Glass Company, Limited. Active years: 1995.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Fumiko Nonaka. Retrieved from https://idiyas.com/inventor/fumiko-nonaka

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 7.0

ph-index = 1

Forward Citations = 26(Granted Patents)


Company Filing History:


Years Active: 1995

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1 patent (USPTO):Explore Patents

Title: Fumiko Nonaka: Innovator in Optical Technology

Introduction

Fumiko Nonaka is a prominent inventor based in Yokohama, Japan. She has made significant contributions to the field of optical technology, particularly through her innovative patents. Her work focuses on enhancing the performance and durability of optical articles.

Latest Patents

Fumiko Nonaka holds a patent for an optical article that features an antireflection layer. This invention comprises a layer of resin that possesses self-healing properties and scuff resistance, along with an antireflection layer made of a non-crystalline fluorine-containing polymer. This advancement is crucial for improving the longevity and functionality of optical devices.

Career Highlights

Fumiko Nonaka is associated with Asahi Glass Company, Limited, where she has been instrumental in developing cutting-edge optical materials. Her expertise and innovative mindset have positioned her as a key player in her field.

Collaborations

Fumiko has collaborated with notable colleagues, including Takafumi Hasegawa and Ko Aosaki. These partnerships have fostered a creative environment that encourages the development of groundbreaking technologies.

Conclusion

Fumiko Nonaka's contributions to optical technology exemplify her dedication to innovation and excellence. Her patent for an optical article with advanced properties showcases her ability to address industry challenges effectively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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