Nagoya, Japan

Fumihiro Kimura

This inventor holds 1 USPTO granted patent. Top assignee: The Pilot Ink Co., Ltd.. Active years: 2008.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Fumihiro Kimura. Retrieved from https://idiyas.com/inventor/fumihiro-kimura-2oo52lvo

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 8(Granted Patents)


Company Filing History:


Years Active: 2008

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1 patent (USPTO):Explore Patents

Title: Fumihiro Kimura: Innovator in Photochromic Materials

Introduction

Fumihiro Kimura is a notable inventor based in Nagoya, Japan. He has made significant contributions to the field of materials science, particularly in the development of photochromic materials. His innovative work has led to the creation of a unique patent that showcases his expertise and creativity.

Latest Patents

Fumihiro Kimura holds a patent for a photochromic material. This material comprises a styrene-based oligomer with a weight average molecular weight ranging from 200 to 6000. It also includes a photochromic compound selected from spirooxazine derivatives and spiropyran derivatives. This invention highlights his ability to blend chemistry and innovation to create advanced materials.

Career Highlights

Kimura is associated with The Pilot Ink Co., Ltd., where he continues to work on innovative projects. His role at the company allows him to apply his knowledge and skills in developing new materials that can have various applications in different industries.

Collaborations

Throughout his career, Fumihiro Kimura has collaborated with talented individuals such as Jun Sugai and Michiyuki Yasuda. These collaborations have likely contributed to the advancement of his research and the successful development of his patented materials.

Conclusion

Fumihiro Kimura is a distinguished inventor whose work in photochromic materials has made a significant impact in the field. His innovative spirit and dedication to research continue to inspire advancements in material science.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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