Company Filing History:
Years Active: 2016
Title: Fumihara Teramae: Innovator in Etching Technology
Introduction
Fumihara Teramae is a notable inventor based in Nagoya, Japan. He has made significant contributions to the field of etching technology, particularly through his innovative methods that enhance the selectivity of etching processes.
Latest Patents
Teramae holds a patent for an etching method that increases the etching selectivity between a subject material and a resist. This method involves several steps, including forming a resist film on a subject material, creating a predetermined pattern on the resist film, and exposing the resist film to plasma under specific conditions to enhance its selectivity. The process culminates in etching the subject material using the resist film as a mask. His patent is a valuable advancement in the development of light-emitting devices that utilize sapphire substrates.
Career Highlights
Fumihara Teramae is currently associated with El-seed Corporation, where he continues to innovate in the field of etching technology. His work has garnered attention for its potential applications in various electronic devices.
Collaborations
He collaborates with talented coworkers, including Atsushi Suzuki and Koichi Naniwae, who contribute to the innovative environment at El-seed Corporation.
Conclusion
Fumihara Teramae's contributions to etching technology exemplify the impact of innovative thinking in advancing electronic manufacturing processes. His work continues to influence the development of new technologies in the industry.