Company Filing History:
Years Active: 2006-2009
Title: Fukuo Oowada: Innovator in Semiconductor Technology
Introduction
Fukuo Oowada is a prominent inventor based in Hitachinaka, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 2 patents. His work focuses on enhancing the performance and reliability of integrated circuit devices.
Latest Patents
Oowada's latest patents include a semiconductor integrated circuit device and a method of manufacturing the same. The first patent describes a semiconductor integrated circuit device that features a capacitor element. This device includes a lower electrode positioned over an element isolation region of a semiconductor substrate's principal surface, with an upper electrode placed above it, separated by a dielectric film. Notably, oxidation-resistant films are incorporated between the element isolation region and the lower electrode, as well as between the lower and upper electrodes. The second patent outlines a method for manufacturing an integrated circuit device, which involves forming an oxidation-resistant film over an isolation region, followed by the creation of a gate insulating film for a MISFET.
Career Highlights
Fukuo Oowada is currently employed at Renesas Technology Corporation, where he continues to innovate in semiconductor technology. His work has been instrumental in advancing the capabilities of integrated circuits, making them more efficient and reliable.
Collaborations
Oowada has collaborated with notable colleagues, including Shinichi Minami and Xiaudong Fang. Their combined expertise has contributed to the successful development of advanced semiconductor technologies.
Conclusion
Fukuo Oowada's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the field. His work continues to influence the development of integrated circuit devices, ensuring their advancement in the technology landscape.