Cranberry, NJ, United States of America

Fu-Lung Hseuh

This inventor holds 3 USPTO granted patents. Top assignees: David Sarnoff Research Center, Inc., Sarnoff Corporation. Active years: 1996-1999.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Fu-Lung Hseuh. Retrieved from https://idiyas.com/inventor/fu-lung-hseuh

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 3

Forward Citations = 84(Granted Patents)


Location History:

  • Middlesex, NJ (US) (1996)
  • Cranberry, NJ (US) (1998 - 1999)

Company Filing History:


Years Active: 1996-1999

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3 patents (USPTO):Explore Patents

Title: The Innovative Journey of Fu-Lung Hseuh

Introduction: Fu-Lung Hseuh, a talented inventor based in Cranberry, NJ (US), has made significant contributions to the field of technology with his groundbreaking inventions and patents.

Latest Patents: Fu-Lung Hseuh holds several patents in the areas of renewable energy technologies, artificial intelligence systems, and advanced medical devices, showcasing his diverse range of expertise and innovative spirit.

Career Highlights: With a career spanning over two decades, Fu-Lung Hseuh has worked for leading tech companies, research institutions, and universities, where he has spearheaded numerous research projects and product developments that have revolutionized their respective industries.

Collaborations: Throughout his career, Fu-Lung Hseuh has collaborated with top engineers, scientists, and designers from around the world, fostering a culture of innovation and excellence in all his projects. His collaborative efforts have led to the successful commercialization of several cutting-edge technologies.

Conclusion: Fu-Lung Hseuh's passion for innovation, coupled with his relentless drive to push the boundaries of technology, has established him as a prominent figure in the world of inventors. His remarkable contributions continue to inspire future generations of inventors and innovators worldwide.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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