Frédéric Chairat

Title: Frédéric Chairat: Innovator in Semiconductor Technology

Introduction

Frédéric Chairat is a notable inventor based in Saint Maximin la Ste, France. He has made significant contributions to the field of semiconductor technology, holding 2 patents that showcase his innovative methods in electronic chip fabrication.

Latest Patents

Frédéric's latest patents focus on the production of semiconductor regions in electronic chips. One of his methods involves fabricating first and second semiconductor regions that are separated by isolating trenches. In this process, a semiconductor substrate is covered with silicon nitride. The silicon nitride above the first region is doped through ion implantation. Trenches are then etched through the silicon nitride, and the doped silicon nitride is partially etched in an isotropic manner. The trenches are filled with an insulator to a level above that of the first region. Finally, the silicon nitride is removed, resulting in the edges of the first region being covered with an insulator annulus.

Career Highlights

Frédéric Chairat is currently employed at STMicroelectronics (Rousset) SAS, where he continues to develop innovative solutions in semiconductor technology. His work has contributed to advancements in electronic chip design and fabrication.

Collaborations

Frédéric collaborates with talented coworkers, including Franck Julien and Noémie Blanc, who share his passion for innovation in the semiconductor industry.

Conclusion

Frédéric Chairat's contributions to semiconductor technology through his patents and work at STMicroelectronics highlight his role as a key innovator in the field. His methods for fabricating semiconductor regions are paving the way for advancements in electronic chip technology.