Fritz Gans

Title: The Innovations of Fritz Gans

Introduction

Fritz Gans is a notable inventor based in München, Germany. He has made significant contributions to the field of particle beam lithography and optical projection systems. With a total of 4 patents to his name, Gans has developed innovative methods and devices that enhance the precision and efficiency of these technologies.

Latest Patents

One of Gans's latest patents is a method for compensating for scatter and reflection effects in particle beam lithography. This method involves providing at least one layer of a material sensitive to particle beams, using a particle beam to write predetermined patterns in a limited area, and writing a frame that surrounds this area. This approach ensures that variations in the background dose are minimized, resulting in a more homogeneous background dose and less variation in critical dimensions. Another significant patent is for a mask used in optical projection systems, which includes a transparent carrier material with an opaque region as an image structure. This mask features a semitransparent dummy structure that enhances the depth of focus, thereby improving the process window of optical projections.

Career Highlights

Fritz Gans has worked with prominent companies such as Infineon Technologies AG and Siemens Aktiengesellschaft. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking advancements in technology.

Collaborations

Throughout his career, Gans has collaborated with notable professionals, including Rainer Pforr and Christoph Friedrich. These partnerships have fostered innovation and have been instrumental in the development of his patented technologies.

Conclusion

Fritz Gans is a distinguished inventor whose work in particle beam lithography and optical projection systems has led to significant advancements in the field. His innovative patents and collaborations highlight his commitment to enhancing technology and improving processes.