Staffanstorp, Sweden

Fredrik Palmquist

This inventor holds 1 USPTO granted patent. Top assignee: Telefonaktiebolaget Lm Ericsson (Publ). Active years: 2002.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Fredrik Palmquist. Retrieved from https://idiyas.com/inventor/fredrik-palmquist-nzzsw1fu

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 7(Granted Patents)


Company Filing History:


Years Active: 2002

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1 patent (USPTO):Explore Patents

Title: Fredrik Palmquist: Innovator in Surface Texture Measurement

Introduction

Fredrik Palmquist is a notable inventor based in Staffanstorp, Sweden. He has made significant contributions to the field of surface texture measurement, showcasing his expertise through his innovative patent.

Latest Patents

Fredrik holds a patent for a "Method for determination of surface texture." This method involves a specified quantification of a maximal height of profile parameter (Rz) and a profile mean wavelength parameter (RSm). His work in this area has the potential to enhance the accuracy and efficiency of surface texture analysis.

Career Highlights

Fredrik is associated with Telefonaktiebolaget LM Ericsson (Publ), a leading telecommunications company. His role at Ericsson allows him to apply his inventive skills in a practical setting, contributing to advancements in technology and engineering.

Collaborations

Fredrik has collaborated with notable colleagues, including Bengt-Göran Rosen and Matti Siivola. These partnerships have fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion

Fredrik Palmquist's contributions to surface texture measurement through his patent and work at Ericsson highlight his role as a significant inventor in the field. His innovative methods continue to influence the industry and pave the way for future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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