Company Filing History:
Years Active: 2000
Title: **Innovator Spotlight: Frederique Glowacki**
Introduction
Frederique Glowacki is an esteemed inventor located in Ulm, Germany. With a keen focus on advancements in semiconductor processing, he holds a significant patent that exemplifies innovation in the field of material science. His work not only enhances the efficiency of manufacturing processes but also contributes to the broader landscape of technological development.
Latest Patents
Glowacki's notable patent is titled "Method of Rapid Thermal Processing (RTP) of Ion Implanted Silicon." This invention presents a novel approach to rapid thermal processing of silicon substrates. The method involves several key steps: first, contacting the substrate's surface, which has been implanted with dopant ions, with a reactive gas. Next, processing the substrate at specified time and temperature parameters creates a protective layer on the surface. Finally, the substrate undergoes annealing to activate the dopant material, ensuring the sheet resistivity remains below 500 ohms/square. Importantly, this process does not allow the implanted dopant ions to migrate deeper than 80 nanometers from the surface, thereby maintaining the integrity of the substrate.
Career Highlights
Frederique Glowacki is currently affiliated with Steag RTP Systems GmbH, where he applies his expertise in semiconductor technology. His work centers around improving thermal processing methods, which can significantly reduce production times and enhance the quality of semiconductor devices. Glowacki's contributions to the field have made him a valuable asset to his team and the company as a whole.
Collaborations
Within Steag RTP Systems GmbH, Glowacki collaborates with talented colleagues, including Steven D. Marcus and Barbara Froeschle. Their combined efforts foster a creative and innovative environment, driving advancement in the realm of thermal processing technologies.
Conclusion
Frederique Glowacki is a remarkable inventor whose work in rapid thermal processing of silicon substrates showcases his dedication to innovation. His patent not only underscores the importance of efficient semiconductor manufacturing but also positions him as a key figure in the technological landscape. As advancements in technology continue to evolve, Glowacki's contributions will undoubtedly pave the way for further developments in the field.