Company Filing History:
Years Active: 2004-2007
Title: Frederik T E Heuts: Innovating Lithographic Projection Technology
Introduction: Frederik T E Heuts is a talented inventor based in Eindhoven, NL, known for his contributions to the field of lithographic projection technology. With a total of 3 patents under his name, Heuts has been a driving force behind advancements in off-axis levelling procedures within lithographic projection apparatus.
Latest Patents: Heuts' latest patents revolve around off-axis levelling in lithographic projection apparatus. This innovative procedure involves generating a height map of the substrate at a measurement station, referencing it to a physical reference surface of the substrate table. By measuring the height of the physical reference surface at the exposure station and relating it to the focal plane of the projection lens, Heuts' patents aim to determine the optimum height and tilt of the substrate table for achieving the best focus during exposure. These principles can also be applied to reflective masks, showcasing the versatility and impact of his inventions.
Career Highlights: Frederik T E Heuts is associated with Asml Netherlands B.V., a leading company in the field of lithography technology. His work at Asml has been instrumental in pushing the boundaries of lithographic projection technology and enhancing the precision and efficiency of semiconductor manufacturing processes. Heuts' dedication to innovation and problem-solving has undoubtedly made a significant mark in the industry.
Collaborations: Heuts has collaborated with notable coworkers such as Theodorus Marinus Modderman and Gerrit Johannes Nijmeijer. Together, they have likely synergized their expertise to bring forth groundbreaking developments in lithographic projection technology. The spirit of teamwork and shared knowledge has been a driving force behind Heuts' inventive success.
Conclusion: Frederik T E Heuts stands as a visionary inventor whose work in lithographic projection technology has revolutionized the semiconductor industry. His patents demonstrate a deep understanding of complex processes and a commitment to enhancing the performance and accuracy of lithographic systems. With an impressive portfolio of innovations, Heuts continues to inspire the next generation of inventors and researchers in the field.