This inventor holds 1 USPTO granted patent. Top assignee: Plessey Overseas Limited. Active years: 1990.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1990
Title: The Innovations of Frederick S. Ward
Introduction
Frederick S. Ward is a notable inventor based in Northampton, GB. He is recognized for his contributions to the field of radar technology, particularly through his innovative patent related to radar transparent materials. His work has significant implications for various applications in both military and civilian sectors.
Latest Patents
Ward holds a patent for radar transparent materials. This invention describes a structure designed to reflect visible light or near-visible light while being substantially transparent to microwave radiation of a predetermined wavelength. The structure is formed of a low dielectric constant material with an external surface that includes an electrically conductive layer featuring an array of slots. This unique design allows the material to be reflective to light while maintaining transparency to specific microwave frequencies.
Career Highlights
Frederick S. Ward has made significant strides in his career, particularly through his work at Plessey Overseas Limited. His innovative approach to radar technology has positioned him as a key figure in the development of materials that enhance the functionality of radar systems. His patent is a testament to his expertise and forward-thinking in the field.
Collaborations
Throughout his career, Ward has collaborated with notable individuals such as William G. Howell and John F. Graver. These partnerships have likely contributed to the advancement of his work and the successful development of his patented technologies.
Conclusion
Frederick S. Ward's contributions to radar technology through his innovative patent for radar transparent materials highlight his role as a significant inventor in the field. His work continues to influence advancements in technology and materials science.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
