Norwalk, CT, United States of America

Frederick M Pressman


Average Co-Inventor Count = 2.4

ph-index = 2

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 1993

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2 patents (USPTO):Explore Patents

Title: Innovations by Frederick M. Pressman: A Glimpse into His Contributions

Introduction

Frederick M. Pressman, based in Norwalk, CT, is a notable inventor recognized for his significant contributions to the field of semiconductor manufacturing. With a total of two patents to his name, Pressman has been instrumental in advancing technologies that improve manufacturing processes within the industry.

Latest Patents

Pressman's latest patents encapsulate innovative approaches to materials used in semiconductor technology. The first patent is for a **Photosensitive Reactive Ion Etch Barrier**, where reaction products of organosilane compounds and a novolac resin featuring phenolic groups exhibit a notably low etching rate. This discovery enhances the material's applicability as an RIE barrier in semiconductor manufacturing processes. The particular photosensitive material associated with this invention is characterized by its unique chemical formula.

His second patent, the **Thermographic Reversible Photoresist**, involves reaction products of organosilane compounds and novolac resin with phenolic groups that can generate both positive and negative tone patterns depending on processing time and temperature. This capability opens up new possibilities for versatility in semiconductor applications, with specific photosensitive materials linked to this patent also described by their chemical formula.

Career Highlights

Frederick M. Pressman works at the renowned International Business Machines Corporation (IBM), a company recognized worldwide for its commitment to innovation and technological advancement. His work has contributed to IBM’s legacy of pioneering technology solutions and enhancing semiconductor manufacturing processes.

Collaborations

Throughout his career, Pressman has collaborated with talented colleagues such as Peter A. Agostino and Adolph Herbst. These collaborations have likely fostered a rich exchange of ideas, leading to advancements in technology and contributing to the successful realization of their innovative projects.

Conclusion

With a proven track record of patents and a commitment to innovation, Frederick M. Pressman stands out as a key figure in the field of semiconductor technology. His work in developing new materials for semiconductor manufacturing not only showcases his ingenuity but also exemplifies the significant impact of innovation on the industry.

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