Frederic N Schwettmann

Title: Frederic N Schwettmann: Innovator in X-ray Technology

Introduction

Frederic N Schwettmann is a notable inventor based in San Jose, CA. He has made significant contributions to the field of X-ray technology, particularly through his innovative patents. With a total of 2 patents, Schwettmann's work has advanced the capabilities of X-ray masks and vacuum windows.

Latest Patents

One of his latest patents involves a silicon carbide film for X-ray masks and vacuum windows. This patent describes a layered structure designed for use in an X-ray membrane mask or a vacuum window. The invention features an intermediate amorphous layer, such as silicon dioxide, grown on a silicon substrate. This layer serves as a stress relief medium and enhances the surface properties of subsequent process layers. The deposition of an inorganic overcoat, such as silicon carbide, on this intermediate layer results in a nearly defect-free layer with significantly reduced stress, suitable for X-ray lithography mask fabrication. Additionally, alternating layers of silicon carbide film and an intermediate inorganic layer, like silicon nitride, can be deposited to achieve an even smoother silicon carbide surface and a stronger structure.

Career Highlights

Frederic N Schwettmann is currently associated with Hewlett-Packard Company, where he continues to innovate in the field of X-ray technology. His work has been instrumental in developing advanced materials and structures that enhance the performance of X-ray systems.

Collaborations

Throughout his career, Schwettmann has collaborated with esteemed colleagues, including Armand P Neukermans and Kuo L Chiang. These collaborations have further enriched his research and development efforts.

Conclusion

Frederic N Schwettmann's contributions to X-ray technology through his patents and collaborations highlight his role as a leading inventor in this field. His innovative approaches continue to influence advancements in X-ray lithography and related technologies.