Fred Yingyi Chen

Title: Innovations of Fred Yingyi Chen

Introduction

Fred Yingyi Chen is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of plasma processing technology, holding a total of 2 patents. His work focuses on enhancing the efficiency and uniformity of plasma treatment for wafers, which is crucial in various semiconductor manufacturing processes.

Latest Patents

Fred Yingyi Chen's latest patents include innovative methods and apparatuses for plasma treating wafers. One of his patents describes an induction plasma processing chamber that features a multiturn helical coil designed to reduce capacitive coupling while maintaining high induction power density and uniformity of reactive species. This invention includes multiple embodiments, such as a can-like dielectric that promotes plasma species approaching the wafer surface at low pressure, resulting in higher plasma density and etch rates. Another patent outlines a method and reactor for generating high-density uniform plasma, utilizing a unique coil configuration atop a dielectric ceiling that varies in height according to its shape. This design allows for effective RF power coupling to excite the plasma, ensuring a high-density uniform ion plasma for large wafer treatments.

Career Highlights

Fred Yingyi Chen is currently associated with Nano-Architect Research Corporation, where he continues to innovate in the field of plasma technology. His work has been instrumental in advancing the capabilities of plasma processing, which is vital for the semiconductor industry.

Collaborations

Fred has collaborated with notable colleagues, including David Guang-Kai Jeng and Hong-Ji Lee, contributing to the development of advanced plasma technologies.

Conclusion

Fred Yingyi Chen's contributions to plasma processing technology through his patents demonstrate his commitment to innovation in the semiconductor field. His work continues to influence the efficiency and effectiveness of wafer treatment processes.