Lexington, KY, United States of America

Fred M Creekmore


Average Co-Inventor Count = 4.4

ph-index = 2

Forward Citations = 16(Granted Patents)


Company Filing History:


Years Active: 1981

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2 patents (USPTO):Explore Patents

Title: Fred M Creekmore: Innovator in Correction Compositions

Introduction

Fred M Creekmore is a notable inventor based in Lexington, KY (US). He has made significant contributions to the field of adhesive correction compositions, holding a total of 2 patents. His work focuses on developing innovative solutions for correcting erroneously typed images on various substrates.

Latest Patents

Creekmore's latest patents include two key inventions. The first is an "Adhesive correction composition and method of use," which involves low tack pressure sensitive compositions containing polyethylene, a tackifier, an isobutylene polymer, a copolymer of ethylene and/or propylene, and a monoethylenically unsaturated ester along with a carboxylic acid and/or ester. This invention is designed to effectively remove erroneously typed images from a substrate. The second patent is a "Pressure sensitive correction composition and method of use," which also features low tack pressure sensitive compositions. This invention includes a paraffinic wax and/or polyethylene resin, a tackifier, an isobutylene polymer, and a copolymer of ethylene and/or propylene, aimed at the same purpose of correcting typed images.

Career Highlights

Fred M Creekmore is associated with the International Business Machines Corporation (IBM), where he has been able to apply his innovative ideas in a corporate environment. His work at IBM has allowed him to contribute to advancements in adhesive technologies.

Collaborations

Throughout his career, Creekmore has collaborated with notable colleagues, including Dorothy J Kennair and Benjamin F Livingston. These collaborations have likely enriched his work and led to further innovations in his field.

Conclusion

Fred M Creekmore is a distinguished inventor whose contributions to adhesive correction compositions have made a significant impact. His patents reflect his commitment to innovation and problem-solving in the realm of correction technologies.

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