Fred L Roe

Title: **Fred L Roe: Innovator in Silicon Layer Etching**

Introduction

Fred L Roe, an accomplished inventor based in Boise, ID, has made significant contributions to the field of semiconductor manufacturing. With a total of six patents to his name, he is recognized for his innovative techniques that enhance the etching processes used in the production of silicon-based devices. His expertise has been instrumental in advancing technologies critical to modern electronics.

Latest Patents

Roe's most recent patents demonstrate his pioneering work in the etching of silicon layers. One of his notable inventions is the "Method for enhancing silicon dioxide to silicon nitride selectivity." This patent describes a sophisticated process for controlling the plasma etch of a silicon dioxide layer at high etch rates and selectivity levels concerning silicon nitride. The method involves maintaining different sections of the etch chamber at elevated temperatures and utilizing specific etch chemistries, including a fluorohydrocarbon gas that contains an ideal balance of hydrogen and fluorine atoms, such as CHF or CHF.

In addition, he holds a patent titled "Method of etching a substrate," which focuses on similarly controlling the etch of a silicon dioxide layer through elevated temperature maintenance within the etch chamber, enhancing the efficiency of multilayer structures.

Career Highlights

Fred L Roe currently works at Micron Technology Incorporated, a leader in semiconductor technology and memory solutions. His role within the company allows him to apply his expertise in developing advanced materials and processes that meet the challenging demands of the electronics industry. His contributions have substantially improved the performance and reliability of semiconductor devices.

Collaborations

Throughout his career, Roe has collaborated with notable coworkers such as Guy T Blalock and David S Becker. These partnerships have fostered a culture of innovation and teamwork, facilitating the exchange of ideas and expertise that drive technological advancements in the semiconductor field.

Conclusion

Fred L Roe is a distinguished inventor whose innovative methods for silicon layer etching significantly impact the semiconductor manufacturing industry. His patents reflect his dedication to enhancing process efficiencies and material selectivity, solidifying his reputation as a leading figure in the field of semiconductor technology. As he continues to work at Micron Technology Incorporated, it is clear that his contributions will remain vital to the evolution of modern electronics.