Bosch en Duin, Netherlands

Fred Bijkerk


Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 7(Granted Patents)


Company Filing History:


Years Active: 2012

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1 patent (USPTO):Explore Patents

Title: Fred Bijkerk: Innovator in EUV Lithography Technology

Introduction

Fred Bijkerk is a notable inventor based in Bosch en Duin, Netherlands. He has made significant contributions to the field of lithography, particularly in the development of reflective optical elements for extreme ultraviolet (EUV) lithography devices. His innovative work has implications for advanced manufacturing processes in the semiconductor industry.

Latest Patents

Fred Bijkerk holds a patent for a reflective optical element designed for EUV lithography devices. This patent, which is a crucial advancement in the field, describes a reflective optical element that enhances maximum reflectivity at operating wavelengths in the extreme ultraviolet or soft x-ray wavelength range. The invention includes a first additional intermediate layer that increases reflectivity and a second additional intermediate layer that prevents chemical interaction between the first additional intermediate layer and the adjoining spacer layer and/or the absorber layer. This innovation is pivotal for improving the efficiency and effectiveness of lithography processes.

Career Highlights

Fred Bijkerk is associated with Carl Zeiss GmbH, a leading company in optical systems and lithography technology. His work at Carl Zeiss has positioned him as a key player in the advancement of optical technologies used in semiconductor manufacturing. His expertise and innovative mindset have contributed to the company's reputation for excellence in the field.

Collaborations

Fred has collaborated with notable colleagues, including Andrey E Yakshin and Robbert W E Van De Kruijs. These collaborations have fostered a productive environment for innovation and have led to significant advancements in optical technologies.

Conclusion

Fred Bijkerk's contributions to the field of EUV lithography through his innovative patent and work at Carl Zeiss GmbH highlight his importance as an inventor. His advancements in reflective optical elements are set to influence the future of semiconductor manufacturing.

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