The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 8144830 B1

PDF
Full Text
Expired
Date of Patent:
Mar. 27, 2012

Filed:

Aug. 05, 2009
Applicants:

Andrey E. Yakshin, Nieuwegein, NL;

Robbert W. E. Van DE Kruijs, Nieuwegein, NL;

Fred Bijkerk, Bosch en Duin, NL;

Eric Louis, Ijsselstein, NL;

Ileana Nedelcu, Nieuwegein, NL;

Inventors:

Andrey E. Yakshin, Nieuwegein, NL;

Robbert W. E. Van De Kruijs, Nieuwegein, NL;

Fred Bijkerk, Bosch en Duin, NL;

Eric Louis, Ijsselstein, NL;

Ileana Nedelcu, Nieuwegein, NL;

Assignee:

Carl Zeiss GmbH, Oberkochen, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G21K 3/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A reflective optical element exhibits an increase in the maximum reflectivity at operating wavelengths in the extreme ultraviolet or soft x-ray wavelength range. A first additional intermediate layer () and a second additional intermediate layer () are provided between the absorber layer () and the spacer layer (), wherein the first additional intermediate layer increases the reflectivity and the second additional intermediate layer () prevents chemical interaction between the first additional intermediate layer () and the adjoining spacer layer () and/or the absorber layer ().


Find Patent Forward Citations

Yakshin, Andrey. (2012). Reflective optical element for euv lithography device (U.S. Patent No. 8144830). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8144830

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