Fred AmRhein

Title: Fred AmRhein: Innovator in Plasma Etch Resistant Coatings

Introduction

Fred AmRhein is a notable inventor based in Fountain Hills, AZ (US). He has made significant contributions to the field of semiconductor technology, particularly in the development of protective coatings for deposition chambers.

Latest Patents

AmRhein holds a patent for a plasma etch resistant coating and process. This innovative protective coating is designed for susceptors used in semiconductor deposition chambers. The patent describes methods for using the coating to protect CVD chamber equipment, such as a susceptor, from plasma etch cleaning. In the preferred embodiments, the chamber equipment is first coated with an emissivity-stabilizing layer, such as silicon nitride, which is then superficially oxidized. After multiple cycles of deposited silicon nitride on various substrates, a plasma cleaning process is conducted, which is selectively effective against the silicon oxynitride protective coating. Following this process, the emissivity-stabilizing layer is reapplied, oxidized, and deposition cycles can resume.

Career Highlights

AmRhein's career is marked by his work at Asm America, Inc., where he has been instrumental in advancing semiconductor technologies. His innovative approach to protective coatings has positioned him as a key figure in the industry.

Collaborations

AmRhein collaborates with various professionals in the field, including his coworker Christophe F Pomarede. Their combined expertise contributes to the ongoing development of advanced semiconductor technologies.

Conclusion

Fred AmRhein's contributions to the field of semiconductor technology through his innovative patent for plasma etch resistant coatings highlight his role as a significant inventor. His work continues to influence the industry and improve the efficiency of semiconductor deposition processes.