Rothenburg, Switzerland

Franz Hurschler

This inventor holds 1 USPTO granted patent. Top assignee: Rhodia Filtec Ag. Active years: 2000.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Franz Hurschler. Retrieved from https://idiyas.com/inventor/franz-hurschler

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2000

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1 patent (USPTO):Explore Patents

Title: Franz Hurschler: Innovator in Technical Fabrics for Airbags

Introduction

Franz Hurschler is a notable inventor based in Rottenburg, Switzerland. He has made significant contributions to the field of technical fabrics, particularly in the development of materials used for airbags. His innovative approach has led to advancements that enhance safety in automotive applications.

Latest Patents

Franz Hurschler holds 1 patent for his work on technical fabrics specifically designed for airbags. This patent reflects his commitment to improving safety features in vehicles, showcasing his expertise in material science and engineering.

Career Highlights

Hurschler is currently employed at Rhodia Filtec AG, a company known for its focus on specialty chemicals and advanced materials. His role at the company allows him to leverage his skills in developing innovative solutions that meet industry demands.

Collaborations

Franz Hurschler collaborates with his coworker, Remi LaLonde, to further enhance the research and development of technical fabrics. Their teamwork exemplifies the importance of collaboration in driving innovation within the industry.

Conclusion

Franz Hurschler's contributions to the field of technical fabrics for airbags highlight his role as an inventor dedicated to improving safety in automotive technology. His work continues to influence advancements in material science and engineering.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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