Prague, Czechia

Frantisek Maca

This inventor holds 1 USPTO granted patent. Top assignee: Hitachi, Ltd.. Active years: 2011.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Frantisek Maca. Retrieved from https://idiyas.com/inventor/frantisek-maca

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 8(Granted Patents)


Company Filing History:


Years Active: 2011

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1 patent (USPTO):Explore Patents

Title: Frantisek Maca: Innovator in Magnetoresistive Devices

Introduction

Frantisek Maca is a notable inventor based in Prague, Czech Republic. He has made significant contributions to the field of magnetoresistive devices, showcasing his innovative spirit and technical expertise. His work has implications for various applications in electronics and data storage.

Latest Patents

Frantisek Maca holds a patent for a magnetoresistive device. This device comprises a ferromagnetic region, a non-ferromagnetic region, an insulating region, and a conductive region. The insulating region is strategically arranged between the ferromagnetic region and the conductive region to provide a tunnel barrier. The non-ferromagnetic region serves to separate the insulating region from the ferromagnetic region, enhancing the device's functionality.

Career Highlights

Frantisek Maca is currently employed at Hitachi, Ltd., where he continues to develop innovative technologies. His work at Hitachi has allowed him to collaborate with leading experts in the field, further advancing his research and contributions to magnetoresistive devices.

Collaborations

Frantisek has worked alongside notable colleagues such as Joerg Wunderlich and Byong Guk Park. Their collaborative efforts have fostered a productive environment for innovation and research.

Conclusion

Frantisek Maca's contributions to the field of magnetoresistive devices highlight his role as an influential inventor. His patent and ongoing work at Hitachi, Ltd. demonstrate his commitment to advancing technology in this area.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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