Boxmeer, Netherlands

Fransiscus J Van De Weyer

This inventor holds 1 USPTO granted patent. Top assignee: Stork X-Cel B.v.. Active years: 1996.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Fransiscus J Van De Weyer. Retrieved from https://idiyas.com/inventor/fransiscus-j-van-de-weyer

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 11(Granted Patents)


Company Filing History:


Years Active: 1996

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1 patent (USPTO):Explore Patents

Title: The Innovations of Fransiscus J Van De Weyer

Introduction

Fransiscus J Van De Weyer is a notable inventor based in Boxmeer, Netherlands. He has made significant contributions to the field of printing technology, particularly with his innovative designs for inkjet printers. His work has been recognized in the industry, showcasing his expertise and creativity.

Latest Patents

Fransiscus holds a patent for an inkjet nozzle specifically designed for inkjet printers. This invention is crucial for enhancing the efficiency and quality of printing processes. He has 1 patent to his name, reflecting his commitment to innovation in this area.

Career Highlights

Fransiscus is currently employed at Stork X-Cel B.V., a company known for its advancements in printing technology. His role at the company allows him to further develop his ideas and contribute to the evolution of inkjet printing solutions.

Collaborations

Throughout his career, Fransiscus has worked alongside talented colleagues, including Christiaan P Bibbe and Martinus J Hester. These collaborations have fostered a creative environment that encourages the exchange of ideas and innovation.

Conclusion

Fransiscus J Van De Weyer is a distinguished inventor whose work in inkjet technology has made a lasting impact. His patent for an inkjet nozzle exemplifies his innovative spirit and dedication to improving printing solutions.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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