Franklin M Schellenberg

Title: Franklin M Schellenberg: Innovator in Optical Lithography and Nonlinear Devices

Introduction

Franklin M Schellenberg is a notable inventor based in Cupertino, CA. He holds a total of 7 patents that showcase his contributions to the fields of optical lithography and nonlinear optical devices. His innovative work has significantly impacted technology and manufacturing processes.

Latest Patents

One of his latest patents is a method for the repair of defects in lithographic masks. This invention relates to a technique for addressing defects in the nonprinting region of a phase-shifting optical lithography mask by depositing an opaque material on the defect from a gaseous precursor through beam-induced deposition. Another significant patent is for a nonlinear optical device and its manufacturing method. This device comprises a substrate and a film structure coated onto the substrate. The film features an intercalation structure that includes a semiconductor layer and an organic layer with different energy gaps. The assembly of microcrystals within the film structure operates with light wavelengths, showcasing advanced engineering in optical technology.

Career Highlights

Franklin M Schellenberg has worked with prestigious organizations such as IBM and Leland Stanford Junior University. His experience in these institutions has allowed him to collaborate on groundbreaking projects and further his research in innovative technologies.

Collaborations

Some of his notable coworkers include Jean-Claude J Baumert and Gary C Bjorklund. Their collective expertise has contributed to the advancement of their respective fields.

Conclusion

Franklin M Schellenberg's contributions to optical lithography and nonlinear devices highlight his role as a significant inventor. His patents reflect a commitment to innovation and technological advancement.