This inventor holds 1 USPTO granted patent. Top assignee: Ebara Technologies Incorporated. Active years: 1993.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1993
Title: Frank W Engle: Innovator in Cryogenic Vacuum Pumping Technology
Introduction
Frank W Engle is a notable inventor based in Alameda, CA (US), recognized for his contributions to the field of cryogenic vacuum pumping. With a focus on enhancing the efficiency and effectiveness of vacuum systems, Engle has developed innovative solutions that address the challenges associated with gas removal in enclosed chambers.
Latest Patents
Engle holds a patent for "Methods and apparatus for cryogenic vacuum pumping with reduced contamination." This patent describes an apparatus for vacuum pumping an enclosed chamber that includes a cryopump in gas communication with the chamber for removing gases through cryocondensation and cryotrapping. The design eliminates the use of sorbent material for cryosorption, thereby reducing the potential for contamination. The auxiliary pumping device can consist of an ion pump or a turbomolecular vacuum pump, with the ion pump being inactivated during periods of high gas loading in the chamber. This vacuum pumping apparatus is particularly beneficial for vacuum pumping in plasma vapor deposition chambers.
Career Highlights
Engle is associated with Ebara Technologies Incorporated, where he has applied his expertise in vacuum technology to develop advanced solutions. His work has significantly contributed to the efficiency of vacuum systems used in various industrial applications.
Collaborations
Engle has collaborated with Johan E De Rijke, working together to enhance the capabilities of vacuum pumping technologies.
Conclusion
Frank W Engle's innovative work in cryogenic vacuum pumping technology has made a significant impact in the field, showcasing his dedication to improving industrial processes. His patent reflects a commitment to reducing contamination and enhancing the efficiency of vacuum systems.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile