Sewell, NJ, United States of America

Frank T Zimone

This inventor holds 1 USPTO granted patent. Top assignee: Denton Vacuum, LLC. Active years: 1999.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Frank T Zimone. Retrieved from https://idiyas.com/inventor/frank-t-zimone

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 10(Granted Patents)


Company Filing History:


Years Active: 1999

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1 patent (USPTO):Explore Patents

Title: Frank T Zimone: Innovator in Ion Source Technology

Introduction

Frank T Zimone is a notable inventor based in Sewell, NJ (US), recognized for his contributions to ion source technology. With a focus on enhancing plasma density and thermal management in thin film devices, Zimone's work has significant implications for various applications in the field of materials science.

Latest Patents

Zimone holds a patent for an "Ion source with pole rings having differing inner diameters." This innovative design features upper and lower magnetic pole rings that are coaxially arranged but differ in inner diameters. The non-symmetrical configuration of these pole pieces creates a unique magnetic flux field, which enhances the plasma region and increases plasma density. This advancement leads to improved thermal management and stoichiometry, ultimately benefiting the fabrication of thin film devices.

Career Highlights

Zimone is currently employed at Denton Vacuum, L.L.C., where he continues to develop cutting-edge technologies in the field of vacuum systems and ion sources. His expertise and innovative approach have positioned him as a valuable asset to the company and the industry at large.

Collaborations

Zimone collaborates with David Boyarsky, leveraging their combined expertise to push the boundaries of ion source technology and improve the performance of thin film devices.

Conclusion

Frank T Zimone's contributions to ion source technology exemplify the impact of innovative thinking in advancing scientific applications. His work not only enhances the efficiency of thin film fabrication but also sets a foundation for future developments in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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