Memmingen, Germany

Frank Steigerwald

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Multivac Sepp Haggenmüller Se & Co. Kg. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Frank Steigerwald. Retrieved from https://idiyas.com/inventor/frank-steigerwald-mf04mltk

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

 

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Frank Steigerwald and Protective Slide Technology

Introduction

Frank Steigerwald is an inventor based in Memmingen, Germany, and is associated with Multivac Sepp Haggenmüller SE & Co. KG. His patent work addresses protective mechanisms for work machines used to process packaging material.

Latest Patents

Steigerwald is credited with 1 patent: “Protective Slide for a Work Machine.” The invention describes a protective slide assembly with an element for connecting it to a work machine and a protective element that moves between release and protection positions. In the protection position, two sensor elements make contact and produce a signal indicating that contact. One sensor moves with the protective element, with a greater motion amplitude than the protective element itself.

Career Highlights

The patent highlights Steigerwald’s contribution to machine safety and sensing in packaging-material processing equipment. Its design links the protective element’s position to a contact signal, providing an indication when the assembly reaches its protection position.

Collaborations

Steigerwald is associated with Multivac Sepp Haggenmüller SE & Co. KG. Dominik Patz and Nick Nobis are identified as coworkers.

Conclusion

Frank Steigerwald’s patent focuses on a sensor-equipped protective slide that supports safety monitoring in work machines for packaging-material processing.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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