This inventor holds 1 USPTO granted patent. Top assignee: Sandia Corporation. Active years: 2014.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2014
Title: Frank R. Smith: Innovator in Electromagnetic Isolation Technologies
Introduction
Frank R. Smith is a notable inventor based in Gardner, Kansas, recognized for his contributions to electromagnetic isolation technologies. With a focus on enhancing the functionality of electromagnetic interference (EMI) structures, Smith has made significant strides in the field of electrical engineering.
Latest Patents
Smith holds a patent for a groundbreaking invention titled "Full tape thickness feature conductors for EMI structures." This innovative design involves the formation of generally annular full tape thickness conductors, which are created in single or multiple tape layers. These conductors are then stacked to produce a solid conductive wall that encloses an electromagnetic isolation cavity. The manufacturing process may utilize punch and fill operations or involve flowing conductor-containing material onto the tape edge surfaces that define the interior sidewalls of the cavity. This patent showcases Smith's expertise and commitment to advancing EMI technology.
Career Highlights
Throughout his career, Frank R. Smith has been associated with Sandia Corporation, where he has contributed to various projects aimed at improving electromagnetic isolation methods. His work has not only enhanced the performance of EMI structures but has also paved the way for future innovations in the field.
Collaborations
Smith has collaborated with esteemed colleagues, including Kenneth A. Peterson and Richard T. Knudson. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and the development of cutting-edge technologies.
Conclusion
Frank R. Smith's innovative work in the realm of electromagnetic isolation technologies exemplifies his dedication to advancing engineering solutions. His patent and collaborations reflect a commitment to excellence and innovation in the field.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
