Frank J Walton

Title: Frank J Walton: Innovator in Reactive Ion Etching Technology

Introduction

Frank J Walton is a notable inventor based in Sunnyvale, CA. He has made significant contributions to the field of reactive ion etching systems. His innovative approach has led to the development of a unique gas feed system that enhances the efficiency of gas plasma energization.

Latest Patents

Frank J Walton holds a patent for a "Gas feed for reactive ion etch system." This patent describes a gas feed system that is particularly useful in a reactive ion etching system. The system introduces gas through an electrode plate, which energizes the gas plasma. A key feature of this invention is the prevention of plasma discharge propagation down the gas feed path. This is achieved by utilizing a feed system where the space between a pair of porous metal plugs is filled with a porous insulating material. The pore size of this material is too small to support discharge, corresponding to the mean free electron path in the gas. This innovation is crucial for improving the performance and reliability of reactive ion etching processes.

Career Highlights

Frank J Walton is associated with GCA Corporation, where he has applied his expertise in developing advanced technologies. His work has been instrumental in enhancing the capabilities of reactive ion etching systems, which are vital in various manufacturing processes, particularly in the semiconductor industry.

Collaborations

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Conclusion

Frank J Walton's contributions to the field of reactive ion etching technology exemplify the impact of innovative thinking in engineering. His patent for the gas feed system showcases his commitment to advancing technology in this critical area.