This inventor holds 1 USPTO granted patent. Top assignee: Other. Active years: 2019.
Company Filing History:
1 out of 834,411 Years Active: 2019
Title: Frank Hans Hoffman: Innovator in X-ray Optics
Introduction
Frank Hans Hoffman is a notable inventor based in Maximiliansau, Germany. He has made significant contributions to the field of X-ray optics, particularly through his innovative designs that enhance the functionality of X-ray diffractometers. His work is characterized by a focus on improving measurement geometries and simplifying the selection of beam paths.
Latest Patents
Hoffman holds a patent for an "X-ray optics assembly with switching system for three beam paths, and associated X-ray diffractometer." This invention features a multilayer mirror, specifically a Goebel mirror, and a sophisticated switching system that allows for the selection of different beam paths for an X-ray beam. The assembly includes a monochromator, particularly a channel-cut crystal, enabling three selectable beam paths. The first beam path bypasses the multilayer mirror and leads past the monochromator, while the second beam path incorporates the multilayer mirror and also leads past the monochromator. The third beam path contains both the multilayer mirror and the monochromator. This invention provides a versatile X-ray optics assembly and diffractometer that can be utilized for various measurement geometries in a straightforward manner.
Career Highlights
Throughout his career, Frank Hans Hoffman has demonstrated a commitment to advancing X-ray technology. His innovative approach has led to the development of solutions that address complex challenges in the field. Hoffman's work is recognized for its practical applications and contributions to scientific research.
Collaborations
Hoffman has collaborated with Kai Uwe Mettendorf, working together to push the boundaries of X-ray optics and improve the functionality of related technologies.
Conclusion
Frank Hans Hoffman is a distinguished inventor whose work in X-ray optics has paved the way for advancements in measurement techniques. His patent reflects a deep understanding of the complexities involved in X-ray diffractometry, showcasing his innovative spirit and dedication to the field.