Frank Erber

Title: Frank Erber: Innovator in Particle Beam Lithography

Introduction

Frank Erber is a notable inventor based in Munich, Germany. He has made significant contributions to the field of particle beam lithography, particularly through his innovative methods that enhance the precision and efficiency of this technology.

Latest Patents

Frank Erber holds a patent for a method aimed at compensating for scatter and reflection effects in particle beam lithography. This method involves several key steps, including the provision of at least one layer of material sensitive to particle beams. It utilizes at least one particle beam to write predetermined patterns in a limited area of this material. Additionally, it incorporates the writing of a frame surrounding the limited area, ensuring that variations in the background dose remain below 30% of the maximum background dose. This innovation leads to a more homogeneous background dose and significantly reduces variations in critical dimensions within the written area, all achieved in a simple and cost-effective manner.

Career Highlights

Frank Erber is currently employed at Infineon Technologies AG, where he continues to develop and refine his innovative techniques in particle beam lithography. His work has positioned him as a key figure in advancing this technology.

Collaborations

Frank collaborates with esteemed colleagues such as Christian Ebi and Torsten Franke, contributing to a dynamic and innovative work environment.

Conclusion

Frank Erber's contributions to particle beam lithography exemplify the impact of innovative thinking in technology. His patent not only addresses critical challenges in the field but also enhances the overall efficiency of the lithography process.