Frank Cerio

Title: Frank Cerio - Innovator in Ion Beam Deposition Technology

Introduction

Frank Cerio is a notable inventor based in Plainview, NY (US). He has made significant contributions to the field of materials science, particularly in the development of methods for forming thin, low resistivity metal layers. His innovative work has implications for various applications in electronics and semiconductor manufacturing.

Latest Patents

Frank Cerio holds a patent for "Ion beam deposition of a low resistivity metal." This patent details methods for depositing metal materials onto substrates via ion beam deposition. The process occurs in a chamber at temperatures of at least 250° C, resulting in high-quality metal films. The thin tungsten films produced exhibit large, highly oriented α(110) grains with a resistivity of less than 10 μΩ-cm and a thickness of less than 300 Å. Similarly, the thin ruthenium films have a resistivity of less than 12 μΩ-cm and a thickness of less than 300 Å.

Career Highlights

Frank Cerio is associated with Veeco Instruments Inc., a company known for its advanced manufacturing equipment and technology. His work at Veeco has allowed him to push the boundaries of ion beam deposition techniques, contributing to the advancement of thin film technology.

Collaborations

Frank collaborates with Tania Henry, who is also involved in innovative projects within the same field. Their partnership exemplifies the collaborative spirit that drives technological advancements in materials science.

Conclusion

Frank Cerio's contributions to ion beam deposition technology highlight his role as an influential inventor in the field. His patented methods for forming low resistivity metal layers are paving the way for advancements in electronics and semiconductor applications.