Frank C Leung

Title: Innovations by Frank C Leung in Lithographic Processing

Introduction

Frank C Leung is an accomplished inventor based in San Jose, CA. He has made significant contributions to the field of lithographic processing through his innovative methods. His work focuses on enhancing the accuracy and efficiency of critical dimension measurements in semiconductor manufacturing.

Latest Patents

Frank C Leung holds a patent for "Methods for critical dimension and focus mapping using critical dimension test marks." This patent describes methods for using critical dimension test marks for the rapid determination of the best focus position of lithographic processing equipment. It also addresses critical dimension measurement analysis across a wafer's surface. In his first embodiment, a plurality of test mark arrays are distributed across the surface of a wafer, with different arrays created at various focus positions. Measurement of the length or area of the resultant test marks allows for the determination of the best focus position of the processing equipment. This method enables critical dimension measurements at multiple points on a wafer, allowing for the assessment of process accuracy and repeatability. Furthermore, it facilitates real-time detection of process degradation. Using test marks that require only a relatively simple optical scanner and sensor, it is possible to measure hundreds of values across a wafer in thirty minutes, compared to the five hours required for comparable measurements with a Scanning Electron Microscope (SEM).

Career Highlights

Frank C Leung is currently employed at Nikon Precision Incorporated, where he continues to develop innovative solutions in lithography. His work has significantly impacted the efficiency of semiconductor manufacturing processes.

Collaborations

Frank has collaborated with notable colleagues, including Etsuya Morita and Christopher Howard Putnam, contributing to advancements in their field.

Conclusion

Frank C Leung's innovative methods in lithographic processing demonstrate his commitment to enhancing semiconductor manufacturing. His contributions are vital for improving accuracy and efficiency in the industry.