Granby, CT, United States of America

Frank C Douglas


Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 30(Granted Patents)


Company Filing History:


Years Active: 1980

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1 patent (USPTO):Explore Patents

Title: Frank C Douglas: Innovator in Photon Absorbing Surfaces

Introduction

Frank C Douglas is a notable inventor based in Granby, CT (US). He has made significant contributions to the field of materials science, particularly in the development of photon absorbing surfaces. His innovative work has led to the creation of a patent that addresses the effective absorption of photons across a broad range of energies.

Latest Patents

Douglas holds a patent for "Photon absorbing surfaces and methods for producing the same." This invention describes surfaces that consist of a two-phase material with a protruding second phase, whose dimensions are on the order of microns. The design allows for the absorption of photons through multiple reflections within the region of the protruding phase. The surfaces are produced by directional solidification of eutectic compositions, which results in aligned second phase microstructures within a metallic matrix. The matrix material is then selectively removed to expose the second phase material, enhancing the efficiency of photon absorption.

Career Highlights

Frank C Douglas has worked with United Technologies Corporation, where he has applied his expertise in materials science to develop innovative solutions. His work has not only contributed to the advancement of technology but has also positioned him as a key figure in his field.

Collaborations

Douglas has collaborated with notable colleagues, including Franklin D Lemkey and Gerald S Golden. These partnerships have fostered an environment of innovation and have led to the successful development of advanced materials and technologies.

Conclusion

Frank C Douglas is a distinguished inventor whose work in photon absorbing surfaces has made a significant impact in the field of materials science. His innovative patent and collaborations highlight his contributions to advancing technology.

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