Frank C Doughty

Title: Innovations by Frank C Doughty

Introduction

Frank C Doughty is an accomplished inventor based in Plano, TX (US). He has made significant contributions to the field of plasma processing technology, holding two patents that showcase his innovative approach to microwave energy applications.

Latest Patents

Doughty's latest patents include a "Method and apparatus for launching microwave energy into a plasma processing chamber." This invention describes a method and apparatus that utilizes a permanent magnet structure to generate the required magnetic field for launching microwave energy into a plasma processing chamber. The design of the waveguide structure serves as an impedance matching device, controlling the microwave field pattern to create a uniform plasma. The waveguide launcher can take various forms, including rectangular, circular, or coaxial, with the permanent magnet material integrated into the sidewalls to optimize performance.

Another notable patent is the "Permanent magnet ECR plasma source with magnetic field optimization." This invention provides an optimized magnetic field for electron cyclotron resonance plasma generation through a shaped pole piece. The pole piece adjusts the spacing between the magnet and the resonance zone, creating a controlled magnetic field configuration that enhances plasma production. The design includes features such as magnetic mirrors to keep the plasma off the pole piece, ensuring efficient operation.

Career Highlights

Doughty has built a successful career in the field of plasma technology, contributing to advancements that have practical applications in various industries. His work at Astex-Plasmaquest, Inc. has positioned him as a key player in the development of innovative plasma solutions.

Collaborations

Doughty collaborates with talented professionals in his field, including his coworker John E Spencer. Their combined expertise fosters an environment of innovation and progress in plasma technology.

Conclusion

Frank C Doughty's contributions to plasma processing technology through his patents reflect his dedication to innovation and excellence. His work continues to influence the industry and pave the way for future advancements.