Berlin, Germany

Frank Bayer

This inventor holds 1 USPTO granted patent and 3 published patent applications. Top assignee: Atotech Deutschland Gmbh & Co. Kg. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Frank Bayer. Retrieved from https://idiyas.com/inventor/frank-bayer-jfzzrs62

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Frank Bayer - Innovator in Plastic Substrate Etching

Introduction

Frank Bayer is a notable inventor based in Berlin, Germany. He has made significant contributions to the field of materials science, particularly in the etching of plastic substrates. His innovative methods have the potential to enhance various applications in the industry.

Latest Patents

Frank Bayer holds a patent for a "Method for etching at least one surface of a plastic substrate." This invention involves a multi-step process that includes a pre-treatment composition with fluorine-free surface-active compounds and an etching composition containing manganese species. Notably, the method does not require rinsing between steps, and the etching composition is free from fluorine-containing compounds.

Career Highlights

Frank Bayer is associated with Atotech Deutschland GmbH & Co. KG, a company known for its expertise in surface finishing and specialty chemicals. His work at Atotech has allowed him to focus on innovative solutions that address industry challenges.

Collaborations

Frank has collaborated with esteemed colleagues, including Carl Christian Fels and Philip Hartmann. These partnerships have fostered a creative environment that encourages the development of cutting-edge technologies.

Conclusion

Frank Bayer's contributions to the field of plastic substrate etching exemplify the spirit of innovation. His patented methods are paving the way for advancements in material processing and application.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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