Company Filing History:
Years Active: 2010
Title: Frank A Alford: Innovator in Copper Sputtering Technology
Introduction
Frank A Alford is a notable inventor based in Spokane Valley, Washington. He holds a significant patent that contributes to advancements in the field of materials science, specifically related to copper sputtering targets. His work is pivotal for industries requiring high-quality metallic materials for sputtering applications.
Latest Patents
Frank A Alford is credited with a patent for "Copper sputtering targets and methods of forming copper sputtering targets." This innovative invention features a copper-comprising sputtering target that includes at least 99.99% copper by weight. The targets exhibit a yield strength of 15 ksi or greater and a Brinell hardness exceeding 40. Notably, the average grain size of these targets ranges from 1 micron to 50 microns, and they also encompass copper alloy variations with specific limits on alloying elements. The methods described in the patent detail the production of both bonded and monolithic copper and copper alloy targets.
Career Highlights
Frank A Alford works at Honeywell International Inc., where he focuses on developing advanced materials for various technologies. His expertise in metallurgy and materials science has positioned him as a valuable contributor to his company's objectives.
Collaborations
Throughout his career, Frank has collaborated with esteemed colleagues, including Vladimir M Segal and Wuwen Yi. These partnerships have further enhanced the innovation within the realm of copper sputtering technologies, leading to advancements that benefit multiple industrial applications.
Conclusion
Frank A Alford’s work exemplifies the spirit of innovation in materials science. His patent on copper sputtering targets not only contributes to advancements in technology but also showcases the importance of collaborative efforts among inventors and researchers in achieving significant breakthroughs. Through his role at Honeywell International Inc., Frank continues to impact the field and inspire future innovations.