Company Filing History:
Years Active: 2010
Title: Francoise Desbiolles: Innovator in Contamination Monitoring Technology
Introduction
Francoise Desbiolles is a prominent legal representative and inventor based in Cruseilles, France. She has made significant contributions to the field of contamination monitoring technology, particularly in the semiconductor industry. Her innovative approach has led to the development of a patented method and device that enhances the monitoring of substrate wafers.
Latest Patents
Francoise holds a patent for a "Method and device for monitoring the contamination of substrate wafers." This device is designed to measure contamination directly within transport enclosures of FOUP or SMIF type. The transport enclosure is placed on an adapter that establishes direct communication with an external gas analyzer. The gas analyzer ionizes the sampled gases and performs analysis by measuring a parameter of the ions resulting from this ionization. This technology allows for the real-time measurement of very low levels of gaseous contamination.
Career Highlights
Francoise has had a successful career at Alcatel, where she has utilized her expertise to advance the company's technological capabilities. Her work has been instrumental in improving the reliability and efficiency of semiconductor manufacturing processes. With her innovative spirit, she continues to push the boundaries of what is possible in contamination monitoring.
Collaborations
Francoise collaborates with talented individuals such as Arnaud Favre and Remi Thollot, who contribute to her projects and enhance the overall innovation process. Their teamwork exemplifies the importance of collaboration in driving technological advancements.
Conclusion
Francoise Desbiolles is a trailblazer in the field of contamination monitoring technology. Her patented innovations and collaborative efforts at Alcatel highlight her commitment to excellence and progress in the semiconductor industry.