Ris Orangis, France

Francois Lange

This inventor holds 1 USPTO granted patent. Top assignee: Smh-Adrex. Active years: 1982.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Francois Lange. Retrieved from https://idiyas.com/inventor/francois-lange-cbea1dvl

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 1.0

ph-index = 1

Forward Citations = 114(Granted Patents)


Company Filing History:


Years Active: 1982

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1 patent (USPTO):Explore Patents

Title: Innovations of Francois Lange in Ink Projection Technology

Introduction

Francois Lange is an innovative inventor based in Ris Orangis, France. He has made significant contributions to the field of printing technology, particularly with his unique approach to ink projection.

Latest Patents

Francois Lange holds a patent for a "Device for projecting ink droplets onto a medium." This device utilizes a set of projection holes to print patterns under selective electrical or light pulse control. The design features a first plate with numerous holes positioned close to the printing medium's surface. A second plate, located slightly away from the first, creates a chamber where ink is locally heated by electrical current. This current is controlled by light that selectively impacts a photoconductive part of the second plate, aligning with each hole or group of holes to form patterns with constant or variable parts. He has 1 patent to his name.

Career Highlights

Francois Lange is associated with Smh-Adrex, where he continues to develop and refine his innovative technologies. His work has the potential to revolutionize the printing industry by enhancing the precision and efficiency of ink application.

Collaborations

Due to space constraints, the collaborations section will be omitted.

Conclusion

Francois Lange's inventive spirit and dedication to advancing printing technology are evident in his patent for an ink projection device. His contributions are paving the way for future innovations in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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