Heythuysen, Netherlands

Franciscus J M Derks

This inventor holds 1 USPTO granted patent. Top assignee: Dsm N.v.. Active years: 2004.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Franciscus J M Derks. Retrieved from https://idiyas.com/inventor/franciscus-j-m-derks

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 15(Granted Patents)


Company Filing History:


Years Active: 2004

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1 patent (USPTO):Explore Patents

Title: Innovations of Franciscus J M Derks

Introduction

Franciscus J M Derks is a notable inventor based in Heythuysen, Netherlands. He has made significant contributions to the field of coatings, particularly with his innovative patent related to radiation curable coating compositions. His work has implications for various industries, enhancing the performance and application of coatings.

Latest Patents

Franciscus J M Derks holds a patent for a radiation curable coating composition. This invention showcases his expertise in developing advanced materials that can be cured using radiation, offering benefits such as faster processing times and improved durability.

Career Highlights

Derks is associated with DSM N.V., a leading global company in the fields of health, nutrition, and materials. His role at DSM N.V. allows him to leverage his innovative ideas and contribute to the company's mission of creating sustainable solutions.

Collaborations

Throughout his career, Franciscus J M Derks has collaborated with esteemed colleagues, including Timothy Edward Bishop and Anthony Joseph Tortorello. These partnerships have fostered a creative environment that encourages the exchange of ideas and advancements in technology.

Conclusion

Franciscus J M Derks exemplifies the spirit of innovation through his work in radiation curable coatings. His contributions not only enhance product performance but also reflect the collaborative nature of modern scientific advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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