Francis P Fehiner

Title: The Innovations of Francis P. Fehiner

Introduction

Francis P. Fehiner is a notable inventor based in Corning, NY (US). He has made significant contributions to the field of electronics, particularly in the development of thin film capacitors. His innovative methods have paved the way for advancements in capacitor technology.

Latest Patents

Fehiner holds a patent for a "Method of forming a thin film capacitor." This patent describes a technique for creating a thin film capacitor that utilizes a tantalum oxide dielectric. The process involves a dielectric substrate with a duplex electrically conductive film, which includes a non-tantalum electrically conductive film electrode covered by a thin tantalum film. This assembly is placed in a vacuum environment containing oxygen and inert gas, allowing for the application of a tantalum oxide film through r-f sputtering while maintaining a cooled state. The resulting composite can then have a second electrically conductive film electrode applied over the tantalum oxide film.

Career Highlights

Fehiner has spent a significant portion of his career at Corning Glass Works, where he has been able to apply his expertise in materials science and engineering. His work has contributed to the advancement of electronic components, particularly in the realm of capacitors.

Collaborations

Throughout his career, Fehiner has collaborated with notable colleagues such as Arthur J. Whitman and Peter L. Young. These collaborations have fostered an environment of innovation and have led to the development of new technologies in the field.

Conclusion

Francis P. Fehiner's contributions to the field of electronics, particularly through his patent for a method of forming a thin film capacitor, highlight his role as an influential inventor. His work continues to impact the industry and inspire future innovations.