Company Filing History:
Years Active: 2006-2007
Title: Innovations by Francis M Tambwe
Introduction
Francis M Tambwe is a notable inventor based in Hillsboro, OR (US). He has made significant contributions to the field of microelectronics, holding 2 patents that showcase his innovative approaches to fabrication processes.
Latest Patents
One of his latest patents is the "Poly Open Polish Process." This method involves fabricating microelectronic structures using at least two material removal steps. In one embodiment, the first removal step utilizes chemical mechanical polishing (CMP) with a slurry that has high selectivity to an interlevel dielectric layer. This allows the CMP step to stop after contacting the etch stop layer, resulting in a uniform topography across the die, wafer, and between wafers. The process also exposes a temporary component, such as a polysilicon gate, which can then be further processed to achieve desired transistor gate properties.
Another significant patent is the "Multi-Platen Multi-Slurry Chemical Mechanical Polishing Process." This method involves a substrate with a nitride structure and an oxide layer. The process includes multiple CMP steps using different slurries to effectively remove the oxide layer while preserving the integrity of the nitride structure. This innovative approach ensures that defects caused by the polishing process are minimized.
Career Highlights
Francis M Tambwe is currently employed at Intel Corporation, where he continues to develop and refine his innovative techniques in microelectronics. His work has contributed to advancements in the efficiency and effectiveness of semiconductor manufacturing processes.
Collaborations
He has collaborated with notable coworkers, including Matthew J Prince and Chris E Barns, who have also contributed to the field of microelectronics.
Conclusion
Francis M Tambwe's innovative patents and contributions to microelectronics highlight his expertise and commitment to advancing technology in this critical field. His work at Intel Corporation continues to influence the future of semiconductor manufacturing.