Bound Brook, NJ, United States of America

Francis A Hibie

This inventor holds 1 USPTO granted patent. Top assignee: Diamond Shamrock Chemicals Company. Active years: 1993.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Francis A Hibie. Retrieved from https://idiyas.com/inventor/francis-a-hibie

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 1993

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1 patent (USPTO):Explore Patents

Title: The Innovations of Francis A. Hibie

Introduction

Francis A. Hibie is a notable inventor based in Bound Brook, NJ (US). He has made significant contributions to the field of radiation curable compositions, particularly through his innovative patent.

Latest Patents

Hibie's most recent patent focuses on starting materials for improved radiation hardenable diluents. This patent describes radiation curable compositions that contain outstanding reactive diluents. The diluents are specifically lower alkyl ether acrylates and methacrylates derived from particular alkoxylated and non-alkoxylated polyols. Notable examples include mono-methoxy trimethylolpropane diacrylate, mono-methoxy neopentyl glycol monoacrylate, and mono-methoxy, ethoxylated neopentyl glycol monoacrylate, which has an average of about two moles of ethylene oxide.

Career Highlights

Hibie is associated with Diamond Shamrock Chemical Company, where he has been able to apply his expertise in developing innovative chemical solutions. His work has contributed to advancements in the field of radiation curing technology.

Collaborations

Hibie has collaborated with notable coworkers such as Robert A. LieBerman and Ira M. Rose, enhancing the innovative environment at Diamond Shamrock Chemical Company.

Conclusion

Francis A. Hibie's contributions to the field of radiation curable compositions highlight his innovative spirit and dedication to advancing chemical technology. His patent reflects a significant step forward in the development of improved diluents for radiation hardening applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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