Toulouse, France

Françoise Massines

This inventor holds 1 USPTO granted patent. Top assignee: Other. Active years: 2001.


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 19(Granted Patents)


Company Filing History:

goldMedal1 out of 834,453 
Other
 patents

Years Active: 2001

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1 patent (USPTO):Explore Patents

Title: Françoise Massines: Innovator in Plasma Surface Treatment

Introduction

Françoise Massines is a notable inventor based in Toulouse, France. He has made significant contributions to the field of plasma technology, particularly in surface treatment methods. His innovative approach has led to the development of a unique patent that addresses the challenges of atmospheric pressure plasma applications.

Latest Patents

Françoise Massines holds a patent for a "Method and device for surface treatment with a plasma at atmospheric pressure." This invention involves creating an electric discharge in an initial gas at atmospheric pressure, positioned between two exciting electrodes. The method includes applying a supply voltage that is an AC voltage, with amplitude and frequency tailored to maintain the excited state of gas components and the presence of electrons during the discharge process.

Career Highlights

Throughout his career, Françoise Massines has focused on advancing plasma technology. His work has been instrumental in enhancing the efficiency and effectiveness of surface treatment processes. With a patent portfolio that includes 1 patent, he continues to push the boundaries of innovation in this specialized field.

Collaborations

Françoise has collaborated with talented individuals such as Nicolas Gherardi and Gamal Gouda. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and expertise, further enhancing the impact of their work in plasma technology.

Conclusion

Françoise Massines is a pioneering inventor whose contributions to plasma surface treatment have paved the way for advancements in the field. His innovative methods and collaborative spirit continue to inspire future developments in technology.

Profile summary based on public USPTO records.
Please report any incorrect information to [email protected]
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